The ORS ref is easy to install and is compatible with the majority of MOVPE reactors.

The ORS ref is a laser based in situ reflectance monitor. It provides reliable and accurate in situ information of the epitaxial process by monitoring the reflectance changes during growth. The ORS ref is an indispensible tool in the development and optimisation of III-V materials, in particular GaN LEDs.

The optics design of the ORS ref can accommodate 1, 2 or 3 lasers, allowing the user the option to customise and select the most appropriate wavelengths for their application.

The ORS ref is easy to install and is compatible with the majority of MOVPE reactors. For large scale MOVPE reactors, several monitors can be installed onto a single process chamber if required.

The use of lasers for reflectometry ensures the highest clarity of the reflectance trace and is optimum for fitting data and modelling of structures.

ORS has unique modelling software R-Fit v4 and the optional R-Fit LIVE which further enhances the value of ORS ref.

ORS ref is suitable for any type of III-V or II-VI structures such as; LEDs, HEMTs, solar cells and lasers and a wide range of material types such as GaN/sapphire, GaN/silicon, InGAs/InP, GaAs and CdHgTe.